The DWL 66+laser lithography system is an economical and high-resolution pattern generator. Suitable for small batch mask plate production and direct writing requirements. DWL 66+has multiple optional modules, such as front and back alignment systems; Laser generators with wavelengths of 405nm and 375nm; Advanced optional: Position accuracy calibration and automatic loading system for up and down versions.

What is more noteworthy isThe performance of DWL 66+in grayscale exposure mode ranges from standard to professional level. This multifunctional technology can create complex 2.5D microstructures for thick photoresist processes in low contrast positive lithography, and is commonly used for micro lenses DOE、 Research fields such as holograms (CGHs) and textured surface structures.

The highly flexible and customizable solution of DWL 66+is tailored specifically for your application and has become a leader in life sciences, advanced packaging, and more MEMS、 The commonly used photolithography research tools in micro optics, semiconductors, and all other applications that require microstructures.

DWL 66⁺Principle:

Using a variable intensity laser beam to perform variable dose exposure on the corrosion-resistant material on the substrate surface, and after development, the required structural contour is formed on the surface of the corrosion-resistant layer.

DWL 66⁺It has the following advantages:

Ÿhigh resolution

Ÿmaskless

ŸMultiple optional modules

ŸFlexibility and customizability

ŸVarious experimental conditions can be set

major function

Ÿ Grating scanning exposure

ŸQuick exposure of complex contentgraphic

Ÿgrayscale lithography

Technical capabilities

ŸExposure area:200×200mm²

ŸSubstrate size:9”x 9”

ŸMultiple direct writing modes

ŸFeature size: as small as300nm

ŸWriting speed（4μmUnder resolution):2000mm2/min

ŸGrayscale exposure mode,1000Grayscale

ŸVector and raster scanning exposure modes

ŸMultiple data input formats

ŸFront to back alignment

Ÿwavelength(405nmperhaps375nmTwo choices)

ŸReal time autofocus system

Script compatibility

Integrated camera system for measurement and inspection

application

Life Sciences, Advanced PackagingMEMSMicro optics, semiconductors, and other fields with micro nano structure requirements.